Platform for Characterization & Tes
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Scanning Probe Microscope Lab.
Structure Analysis Lab.
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ADS：

 Dushu Lake Higher Education Town, Ruoshui Road 398, Suzhou Industrial Park, Suzhou
TEL： 0512-62872554
FAX： 0512-62603079
CODE： 215125
Field Emission SEM  
 
Instruments:
 Field Emission SEM
Model:
 Quanta 400 FEG
Manufacturers:
 FEI, USA
Configuration:
- MonoCL3+ CL system(160-930nm)
- EBIC
- STEM Detector
- Apollo 40 Silicon Drift Detector (Liquid Nitrogen free)
- Liquid helium SEM cold stage (6K—300K)
- Liquid nitrogen SEM cold stage (-185℃—+200℃)
Specifications:
- Field emission gun assembly with Schottky emitter source
- Voltage: 200 V to 30 kV
- Magnification: 12-2,000,000
- Resolution:
High-vacuum:
- 1.2 nm at 30 kV (SE)
- 2.5 nm at 30 kV (BSE)
- 3.0 nm at 1 kV (SE)
Low-vacuum:
- 1.5 nm at 30 kV (SE)
- 2.5 nm at 30 kV (BSE)
- 3.0 nm at 1 kV (SE)
Extended vacuum mode (ESEM)
- 1.5 nm at 30 kV (SE)
- Sample chamber: motorized x-y-z-tilt-rotate stage , 284mm,
- EDS Resolution: 136eV or better (Element Range>B5)
Application:
-  Sample observation in high-vacuum , low-vacuum(130Pa) and ESEM(4000Pa)
-  Surface morphology observation and element composition analysis
-  High speed point/line/surface scanning and EDS mapping
-  284mm sample chamber and suitable for observation of 4 inch silicon wafer
-  CL system for imaging and spectroscopy and more information about band gap and impurities
-  EBIC system for more information about material structures and impurities
 
Contact us:
Xiong-hui Zeng: 0512-62872545; xhzeng2007@sinano.ac.cn
Lu Zhang: 0512-62872554; luzhang2007@sinano.ac.cn
 
 
中国科学院苏州纳米技术与纳米仿生研究所（筹） 中国科学院 中华人民共和国科学技术部 中国科学院半导体研究所 中国科学院青年联合会 苏州独墅湖高等教育区
Copyright ® Platform for Characterization &Test　
　                                                ADS： Dushu Lake Higher Education Town, Ruoshui Road 398, Suzhou Industrial Park, Suzhou