Tecnai Osiris
A revolutionary Analytical TEM/STEM from FEI
Siqun Xiao
Director for Business Development in Materials Science, FEI China
Tecnai Osiris is the newly developed TEM/STEM platform, first introduced in 2010. The new design revolutionized the chemical analyze capability on a TEM/STEM by so called “ChemiSTEM” technology, which include a high brightness FEG gun, patterned designed Super-X SDD EDS detectors and an Ultra-Fast-EDS scan unit. It improved the chemical analytical capability on a TEM/STEM by order of magnitude in not only light element detection, trace element detection, but also in scan speed. The newly developed 3D EDS tomography allows the user to reveal 3D information separated by individual chemical element – leading edge technology which receives more and more attention in scientific community. FEI’s design was awarded the Best Design at the Annual Meeting of American Microscopy and Microanalysis Society in 2010.
About the Speaker:
Dr. Siqun Xiao received his M.S. in Metallurgy from RWTH Aachen and Ph.D in Metal Physics from the University of Goettingen, Germany. He was a Sr. Research Associate at the Case Western Reserve University and a Post Doctoral Fellow at the National Center for Electron Microscopy Center at the Lawrence Berkeley Laboratory of UC California, in Berkeley USA. Before joining FEI in 2010 Dr. Xiao worked as the China Account General Manager for Process Diagnostic and Control Division of Applied Materials.
